Related articles |
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CFP: LCR last call (Troy NY 5/95) deelmane@cs.rpi.edu (1995-01-23) |
Newsgroups: | comp.compilers |
From: | deelmane@cs.rpi.edu (Ewa Deelman) |
Keywords: | CFP, conference |
Organization: | Rensselaer Polytechnic Institute, Troy NY, USA |
Date: | Mon, 23 Jan 1995 01:08:44 GMT |
LAST CALL FOR PAPERS
Third Workshop on Languages, Compilers, and Run-Time Systems
for Scalable Computers
Rensselaer Parallel Software Systems Meeting, Troy, New York, May 22-24, 1995
*******************************************************************************
IMPORTANT DATES
Submission of four-page abstracts: 10 February 1995
Notification of acceptance: 24 March 1995
Final papers due: 22 May 1995
IMPORTANT FILES
ftp: ftp.cs.rpi.edu; directory pub/lcr
url: http://www.cs.rpi.edu/lcr
*******************************************************************************
The third Workshop on Languages, Compilers, and Run-Time Systems for Scalable
Computers will be held at Rensselaer Polytechnic Institute in Troy, New York
on May 22 - 24, 1995. Topics of interest include, but are not restricted to,
the following:
* Machine-independent parallel programming languages, compilers and tools;
* Compiler and run-time communication optimizations;
* Parallel computations over irregular structures;
* Support for task and coarse grain parallelism;
* Optimizations in parallelizing compilers;
* Experience with applying parallel programming languages and software
systems to applications,
The format of the workshop will include 30-minute research presentations,
with ample time for discussion, and group sessions that discuss the
challenges and future directions for research in this area. Submissions will
be reviewed by the Program Committee. Authors will be informed of the status
of their papers by March 24, 1995.
Workshop proceedings will be published by Kluwer Academic Publisher;
camera-ready copies will be due at the workshop. The authors of the best
papers will also be invited to submit the extended versions of the papers
for a special issue of Scientific Programming.
Attendance and presentation of papers is open to all interested parties,
although it may be necessary to limit attendance to retain the workshop
atmosphere. Anyone interested in presenting a paper at the workshop
should submit a four-page extended abstract by February 10, 1995 to
Boleslaw K. Szymanski
Department of Computer Science
Rensselaer Polytechnic Institute
Troy, NY 12180-3590, USA
Electronic submissions are also welcome and should be sent to
lcr@cs.rpi.edu in LaTex, troff, or postscript form.
Anyone interested in attending the workshop, whether presenting a paper
or not, is asked to complete the form below and send it to lcr@cs.rpi.edu.
In case it is necessary to limit attendance, preference will be given to
those responding by March 24, 1995. Registration materials for the workshop
will be available in early April 1995.
*************************************************************************
PRELIMINARY REGISTRATION FORM
Third Workshop on Languages, Compilers, and Run-Time Systems
for Scalable Computers
Troy, New York, May 22 - 24, 1995
NAME ________________________________________________________
ORGANIZATION ________________________________________________
ADDRESS ____________________________________________________
____________________________________________________
____________________________________________________
____________________________________________________
EMAIL ADDRESS ______________________________________________
Do you plan to submit a paper to the workshop? Yes ___ No ___
Please describe briefly (2-4 sentences should suffice in most cases)
why you are interested in attending the workshop and how you would
expect to contribute to it. This information may be used if it is
necessary to limit attendance to the workshop.
Please return this form to lcr@cs.rpi.edu or
Boleslaw K. Szymanski
Department of Computer Science
Rensselaer Polytechnic Institute
Troy, NY 12180-3590, USA
Forms received by March 24, 1995 will receive priority if it is
necessary to limit attendance.
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